发明名称 |
TEXTURE ETCHING SOLUTION COMPOSITION AND TEXTURE ETCHING METHOD OF CRYSTALLINE SILICON WAFERS |
摘要 |
<p>The present invention relates to a texture etching solution composition of a crystalline silicon wafer and a texture etching method of a crystalline silicon wafer. More specifically, the present invention relates to a texture etching solution composition of a crystalline silicon wafer, including an alkaline compound or a compound represented by the chemical formula 1 or 2, and a texture etching method of a crystalline silicon wafer. According to the present invention, the texture etching solution composition of a crystalline silicon wafer and the texture etching method of a crystalline silicon wafer prevent excessive etching due to an alkaline compound by controlling the etching speed different in accordance with silicon crystal orientations to minimize the texture quality variations on the surface of a crystalline silicon wafer per location, to improve the texture uniformity, and to maximize the sunlight absorption.</p> |
申请公布号 |
KR20150108104(A) |
申请公布日期 |
2015.09.25 |
申请号 |
KR20140030860 |
申请日期 |
2014.03.17 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
HONG, HYUNG PYO;PARK, MYUN KYU;LIM, DAE SUNG |
分类号 |
C09K13/02;H01L21/306 |
主分类号 |
C09K13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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