发明名称 TEXTURE ETCHING SOLUTION COMPOSITION AND TEXTURE ETCHING METHOD OF CRYSTALLINE SILICON WAFERS
摘要 <p>The present invention relates to a texture etching solution composition of a crystalline silicon wafer and a texture etching method of a crystalline silicon wafer. More specifically, the present invention relates to a texture etching solution composition of a crystalline silicon wafer, including an alkaline compound or a compound represented by the chemical formula 1 or 2, and a texture etching method of a crystalline silicon wafer. According to the present invention, the texture etching solution composition of a crystalline silicon wafer and the texture etching method of a crystalline silicon wafer prevent excessive etching due to an alkaline compound by controlling the etching speed different in accordance with silicon crystal orientations to minimize the texture quality variations on the surface of a crystalline silicon wafer per location, to improve the texture uniformity, and to maximize the sunlight absorption.</p>
申请公布号 KR20150108104(A) 申请公布日期 2015.09.25
申请号 KR20140030860 申请日期 2014.03.17
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 HONG, HYUNG PYO;PARK, MYUN KYU;LIM, DAE SUNG
分类号 C09K13/02;H01L21/306 主分类号 C09K13/02
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