SEMICONDUCTOR STRUCTURES PROVIDED WITHIN A CAVITY AND RELATED DESIGN STRUCTURES

摘要

Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structures are disclosed. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity. The method for forming the cavity further includes forming at least one first vent hole of a first dimension which is sized to avoid or minimize material deposition on a beam structure during sealing processes. The method for forming the cavity further includes forming at least one second vent hole of a second dimension, larger than the first dimension.

主权项

1. A structure, comprising:
a beam structure located within a cavity; at least one vent hole positioned over a free end of the beam structure, the at least one vent hole having a first size which prevents or minimizes material deposition on the free end of the beam structure; and at least another vent hole positioned over a fixed end of the beam structure, the at least another vent hole having a second size, larger than the first size.