| 摘要 |
PROBLEM TO BE SOLVED: To provide a fluid handling system that does not lose immersion liquid even during substrate and/or substrate table swap.SOLUTION: The fluid handling system supplies and confines liquid between a projection system PS and (i) a substrate W, or (ii) a substrate table WT1, or (iii) a surface of a shutter member 200, or (iv) any combination selected from (i)-(iii). The surface of the shutter member adjoins and is coplanar with a surface of the table. The surfaces of the shutter member and the table may be separated by a gap. A fluid extraction system removes liquid from the gap. |
