PURGE CHAMBER, AND SUBSTRATE-PROCESSING APPARATUS INCLUDING SAME

摘要

Provided is a substrate processing apparatus including a process chamber in which a process for processing a substrate are processed, a purge chamber removing contaminants existing on the substrate, and a transfer chamber connected to a side surface of each of the process chamber and the purge chamber, the transfer chamber including a substrate handler transferring the substrate, on which the process is performed, into the purge chamber between the process chamber and the purge chamber, wherein the purge chamber includes a chamber having an inner space and a passage through which the substrate is taken in or out of the inner space, a substrate holder on which the substrate is placed, the substrate holder being disposed in the chamber, a gas supply port disposed on a side surface with respect to the passage to supply a gas toward the inner space, and an exhaust port disposed on a side opposite to the gas supply port to discharge the gas within the inner space.

主权项

1. A substrate processing apparatus comprising:
a process chamber in which a process for processing a substrate are processed; a purge chamber removing contaminants existing on the substrate; and a transfer chamber connected to a side surface of each of the process chamber and the purge chamber, the transfer chamber comprising a substrate handler transferring the substrate, on which the process is performed, into the purge chamber between the process chamber and the purge chamber, wherein the purge chamber comprises: a chamber having an inner space and a passage through which the substrate is taken in or out of the inner space; a substrate holder on which the substrate is placed, the substrate holder being disposed in the chamber; a gas supply port disposed on a side surface with respect to the passage to supply a gas toward the inner space; and an exhaust port disposed on a side opposite to the gas supply port to discharge the gas within the inner space.