| 摘要 |
<p>PROBLEM TO BE SOLVED: To enable formation of an irregular pattern at low cost and with high yield while suppressing occurrence of defects.SOLUTION: A nanoimprint mold 1 to be used has, on the surface thereof, a main pattern area in which an irregular pattern to be transferred is formed, and a non-main pattern area 3 which is adjacent to the main pattern area 2 and is a dummy pattern having a pattern density or aspect ratio smaller than the irregular pattern or a flat face. Plural kinds of resist liquid 12, 13 which have different components and are different in release force after cured are prepared as resist liquid. In a coating step, resist liquid 12 which is relatively low in the release force after cured is disposed in the area corresponding to the main pattern area 2 on the surface of the nanoimprint substrate 10. A resist liquid 13 which is relatively high in release force after cured is disposed at at least a part of the area 3 corresponding to the non-main pattern area.</p> |
