发明名称 |
METHOD FOR POLISHING WORK AND WORK POLISHING APPARATUS |
摘要 |
A work polishing method according to the present invention can perform a polishing process on a high hardness material with high process efficiency. The work polishing method includes: a pressurizing step of pressurizing the polishing floating of a polishing plate which rotates on a work surface; and a slurry supplying step which supplies slurry while performing the pressurizing step. Activation gas activated by gas discharge is evaporated and mixed with the slurry. |
申请公布号 |
KR20150107630(A) |
申请公布日期 |
2015.09.23 |
申请号 |
KR20150033097 |
申请日期 |
2015.03.10 |
申请人 |
FUJIKOSHI MACHINERY CORPORATION |
发明人 |
SHIBUYA KAZUTAKA;NAKAMURA YOSHIO |
分类号 |
H01L21/304;H01L21/02 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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