发明名称 METHOD FOR POLISHING WORK AND WORK POLISHING APPARATUS
摘要 A work polishing method according to the present invention can perform a polishing process on a high hardness material with high process efficiency. The work polishing method includes: a pressurizing step of pressurizing the polishing floating of a polishing plate which rotates on a work surface; and a slurry supplying step which supplies slurry while performing the pressurizing step. Activation gas activated by gas discharge is evaporated and mixed with the slurry.
申请公布号 KR20150107630(A) 申请公布日期 2015.09.23
申请号 KR20150033097 申请日期 2015.03.10
申请人 FUJIKOSHI MACHINERY CORPORATION 发明人 SHIBUYA KAZUTAKA;NAKAMURA YOSHIO
分类号 H01L21/304;H01L21/02 主分类号 H01L21/304
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