| 摘要 |
An exposure apparatus (10) for exposing a substrate (30) to light through an optical assembly (16) and liquid, the exposure apparatus comprising: a stage (42) for holding the substrate so that the substrate is exposed via the optical assembly and the liquid in a gap between the optical assembly and the substrate on the stage, the stage being movable relative to the optical assembly; and a liquid supply system for supplying liquid into the gap between the optical assembly and the substrate on the stage from an outlet, wherein the stage comprises: a support for supporting the substrate; and a channel for recovering the liquid supplied from the outlet and flowed outwardly from the top surface of the substrate supported by the support. |
