发明名称 SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS
摘要 <p>The purpose of the present invention is to reliably remove liquid on a wafer (W), and reduce operating costs. To achieve the objective of the present invention, a separating and remaking apparatus (30) comprises: a buffer tank (33) for generating mixed liquid having a first fluorine-containing organic solvent with a first boiling point, and a second fluorine-containing organic solvent with a second boiling point higher than the first boiling point; a distillation tank (34) for separating the first fluorine-containing organic solvent in a gaseous form and the second fluorine-containing organic solvent in a liquid form by heating the mixed liquid at the temperature between the first boiling point and the second boiling point; a first tank (35) for liquefying and storing the first fluorine-containing organic solvent in a gaseous form transferred from the distillation tank (34); and a second tank (36) for storing the second fluorine-containing organic solvent in a liquid form transferred from the distillation tank. The distillation tank (34) is capable of separating the mixed liquid at a separating rate corresponding to a mixing rate of the mixed liquid in a buffer tank (33) into liquid containing a lot of the first fluorine-containing organic solvent and liquid containing a lot of the second fluorine-containing organic solvent.</p>
申请公布号 KR20150107632(A) 申请公布日期 2015.09.23
申请号 KR20150033337 申请日期 2015.03.10
申请人 TOKYO ELECTRON LIMITED 发明人 MITSUOKA KAZUYUKI;OHNO HIROKI;ORII TAKEHIKO;TOSHIMA TAKAYUKI
分类号 H01L21/02;H01L21/302 主分类号 H01L21/02
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