发明名称 Thin film field effect transistor and display using the same
摘要 <p>A TFT is provided which includes on a substrate, at least a gate electrode, a gate insulating layer, an active layer containing an amorphous oxide semiconductor, a source electrode, and a drain electrode, wherein a mean square interface roughness between the gate insulating layer and the active layer is less than 2 nm, a carrier concentration of the active layer is 1 × 10 15 cm -3 or more, and a film thickness of the active layer is 0.5 nm or more and less than 20 nm. A TFT is provided which has high field effect mobility and a high ON-OFF ratio, and is improved in environmental temperature dependency. Also, a display using the TFT is provided.</p>
申请公布号 EP2061087(B1) 申请公布日期 2015.09.23
申请号 EP20080019923 申请日期 2008.11.14
申请人 FUJIFILM CORPORATION 发明人 IMAI, SHINJI
分类号 H01L29/786 主分类号 H01L29/786
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