System and method for improved epitaxial lift off

摘要

An apparatus, system and method for performing ELO are disclosed. Device assemblies are contemporaneously etched in a stacked arrangement. Each device assembly may be placed in a respective tray, where the trays are overlapped and spaced apart from one another. In this manner, more device assemblies can be etched per unit area compared to conventional systems. Further, by stacking device assemblies during etching, the yield can be improved and/or the cost of the etch tank and associated hardware can be reduced.

主权项

1. An apparatus comprising:
a plurality of trays operable to accept a plurality of device assemblies, wherein each device assembly of said plurality of device assemblies comprises a respective device and a respective substrate, wherein said plurality of trays are physically spaced apart from one another in a stacked arrangement; a first plurality of members operable to clamp said plurality of device assemblies to said plurality of trays, and wherein said first plurality of members is coupled with a first component operable to contemporaneously move said first plurality of members; and a second plurality of members operable to apply a bending load to said plurality of device assemblies, wherein said second plurality of members is further operable to enable separation of said respective device and said respective substrate responsive to an etching of a respective release layer disposed between said respective device and said respective substrate, and wherein said second plurality of members is coupled with a second component operable to contemporaneously move said second plurality of members.