| 发明名称 | Illumination optical system, exposure apparatus, and device manufacturing method | ||
| 摘要 | An illumination optical system includes: a stop configured to define an illumination range of a surface to be illuminated; an imaging optical system configured to form an image of an aperture of the stop onto the surface to be illuminated; an calculation unit configured to calculate an offset amount between a size of the aperture and a target illumination range of the surface to be illuminated using data on the target illumination range; and an adjusting unit configured to adjust the size of the aperture based on the calculated offset amount. The offset amount differs according to a size of the target illumination range. | ||
| 申请公布号 | US9140991(B2) | 申请公布日期 | 2015.09.22 |
| 申请号 | US201313832706 | 申请日期 | 2013.03.15 |
| 申请人 | CANON KABUSHIKI KAISHA | 发明人 | Saito Nobuyuki |
| 分类号 | G03B27/54;G03B27/72;G03F7/20 | 主分类号 | G03B27/54 |
| 代理机构 | Rossi, Kimms & McDowell LLP | 代理人 | Rossi, Kimms & McDowell LLP |
| 主权项 | 1. An illumination optical system comprising: a stop configured to define an illumination range of a surface to be illuminated; an imaging optical system configured to form an image of an aperture of the stop onto the surface to be illuminated; a calculation unit configured to calculate an offset amount between a size of the aperture and a target illumination range of the surface to be illuminated using data on the target illumination range of the surface to be illuminated; and an adjusting unit configured to adjust the size of the aperture based on the calculated offset amount, wherein the offset amount differs according to a size of the target illumination range of the surface to be illuminated. | ||
| 地址 | JP | ||