| 摘要 |
<p>The present invention relates to a texture etching solution composition and a texture etching method of crystalline silicon wafers and, more specifically, to a texture etching solution composition of crystalline silicon wafers, including an alkaline compound, lignosulfonate, and a polyethylene glycol-based compound having a specific structure, and to a texture etching method of crystalline silicon wafers. Therefore, the texture etching solution composition and a texture etching method of crystalline silicon wafers control the difference of an etching rate for the silicon crystal orientation, and prevent excessive etching caused by the alkaline compound, thereby minimizing the texture quality variations by position, and improving the optical efficiency.</p> |
