发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device in an embodiment includes a first region of a second conductivity type between a first electrode and a second electrode and a second region of a first conductivity type between the first region and the second electrode. a third region of the second conductivity type is between the second region and the second electrode. A fourth and fifth region of the first conductivity type are between the third semiconductor region and the second electrode. The fourth and fifth regions are adjacent to each other. A dopant concentration in the fifth region is less than a dopant concentration in the fourth region. A third electrode contacts the second region, the third region, the fourth region, and the fifth region via an insulating film.
申请公布号 US2015263146(A1) 申请公布日期 2015.09.17
申请号 US201414328109 申请日期 2014.07.10
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OGURA Tsuneo;MATSUDAI Tomoko
分类号 H01L29/739;H01L29/10 主分类号 H01L29/739
代理机构 代理人
主权项 1. A semiconductor device having regions of first and second conductivity types that are opposite conductivity types, comprising: a first semiconductor region of the second conductivity type between, in a first direction, a first electrode and a second electrode; a second semiconductor region of the first conductivity type between, in the first direction, the first semiconductor region and the second electrode; a third semiconductor region of the second conductivity type between, in the first direction, the second semiconductor region and the second electrode; a fourth semiconductor region of the first conductivity type between, in the first direction, the third semiconductor region and the second electrode; a fifth semiconductor region of the first conductivity type between, in the first direction, the third semiconductor region and the second electrode, the fourth and fifth semiconductor regions being adjacent to each other in a second direction that is perpendicular to the first direction, a dopant concentration in the fifth semiconductor region being less than a dopant concentration in the fourth semiconductor region; and a third electrode contacting the second semiconductor region, the third semiconductor region, the fourth semiconductor region, and the fifth semiconductor region via an insulating film.
地址 Tokyo JP