| 发明名称 |
MEASURING APPARATUS AND METHOD OF MANUFACTURING ARTICLE |
| 摘要 |
The present invention provides a measuring apparatus for measuring a shape of an object to be measured, comprising an emitting unit configured to emit pattern light, an optical system configured to guide the pattern light emitted from the emitting unit to the object, a deflection unit arranged between the optical system and the object and configured to deflect the pattern light emitted from the optical system, an image sensing unit configured to capture the object via the optical system and the deflection unit, and a processing unit configured to determine the shape of the object based on an image of the object captured by the image sensing unit, wherein the deflection unit comprises a diffraction grating configured to diffract the pattern light emitted from the optical system. |
| 申请公布号 |
US2015260510(A1) |
申请公布日期 |
2015.09.17 |
| 申请号 |
US201514643170 |
申请日期 |
2015.03.10 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Nakajima Masaki |
| 分类号 |
G01B11/25;G02F1/13;G02B27/28;G02B5/30;G02B27/42;G02B26/08 |
主分类号 |
G01B11/25 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A measuring apparatus for measuring a shape of an object to be measured, comprising:
an emitting unit configured to emit pattern light; an optical system configured to guide the pattern light emitted from the emitting unit to the object; a deflection unit arranged between the optical system and the object and configured to deflect the pattern light emitted from the optical system; an image sensing unit configured to capture the object via the optical system and the deflection unit; and a processing unit configured to determine the shape of the object based on an image of the object captured by the image sensing unit, wherein the deflection unit comprises a diffraction grating configured to diffract the pattern light emitted from the optical system. |
| 地址 |
Tokyo JP |
