| 发明名称 |
CONTROL APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM |
| 摘要 |
A control apparatus is configured to control an operation of a substrate processing apparatus configured to place at least a monitor substrate therein. The control apparatus controls the operation of the substrate processing apparatus based on a difference between a processing result of the monitor substrate processed by the substrate processing apparatus and a predictive result so as to optimize the monitor substrate loading frequency. |
| 申请公布号 |
US2015261212(A1) |
申请公布日期 |
2015.09.17 |
| 申请号 |
US201514645613 |
申请日期 |
2015.03.12 |
| 申请人 |
Tokyo Electron Limited |
发明人 |
Takenaga Yuichi;Saito Takanori |
| 分类号 |
G05B19/418 |
主分类号 |
G05B19/418 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A control apparatus for controlling an operation of a substrate processing apparatus configured to place at least a monitor substrate therein,
wherein the control apparatus controls an operation of the substrate processing apparatus based on a difference between a processing result of the monitor substrate processed by the substrate processing apparatus and a predictive result so as to optimize a monitor substrate loading frequency. |
| 地址 |
Tokyo JP |
