MAGNETIC SCANNING SYSTEM FOR ION IMPLANTERS

摘要

A compact electromagnetic system is disclosed that is capable of scanning an ion beam in two orthogonal directions (e.g., for semiconductor doping or hydrogen induced exfoliation). In particular, according to embodiments of the compact electromagnetic system, the steel yoke, pole pieces, and excitation coils for both the X and Y axis have been integrated into a common structure.

主权项

1. A system for implanting ions into a target substrate, the system comprising:
an ion beam generator configured to generate an ion beam toward a target substrate; an electromagnetic deflection system configured to scan the ion beam over the target substrate in two orthogonal directions, the electromagnetic deflection system consisting of a singular structure incorporating components to deflect the ion beam electromagnetically in each of the two orthogonal directions; and an ion beam controller configured to control the ion beam generation and scanning to implant ions into the target substrate.