发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data. |
申请公布号 |
EP2745174(B1) |
申请公布日期 |
2015.09.16 |
申请号 |
EP20120738445 |
申请日期 |
2012.07.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BLEEKER, ARNO;DE WINTER, LAURENTIUS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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