发明名称 PHOTOSENSITIVE RESIST COMPOSITION
摘要 The present invention relates to a photosensitive resin composition and, more specifically, to a photosensitive resin composition including: a binder resin; a photoacid generator; a sensitizer; a thermal base generator represented by chemical formula 1 or 2; and a solvent, so the photosensitive resin composition is capable of obtaining fast sensitivity and markedly improved transmittance as well as obtaining an insulating film with a pattern adhesion property and excellent uniformity.
申请公布号 KR20150105121(A) 申请公布日期 2015.09.16
申请号 KR20140027374 申请日期 2014.03.07
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 IM, MIN JU;PARK, HAN WOO;LEE, EUN SANG;CHOI, HAN YOUNG
分类号 G03F7/004;G02F1/13;G03F7/11 主分类号 G03F7/004
代理机构 代理人
主权项
地址