发明名称 |
PHOTOSENSITIVE RESIST COMPOSITION |
摘要 |
The present invention relates to a photosensitive resin composition and, more specifically, to a photosensitive resin composition including: a binder resin; a photoacid generator; a sensitizer; a thermal base generator represented by chemical formula 1 or 2; and a solvent, so the photosensitive resin composition is capable of obtaining fast sensitivity and markedly improved transmittance as well as obtaining an insulating film with a pattern adhesion property and excellent uniformity. |
申请公布号 |
KR20150105121(A) |
申请公布日期 |
2015.09.16 |
申请号 |
KR20140027374 |
申请日期 |
2014.03.07 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
IM, MIN JU;PARK, HAN WOO;LEE, EUN SANG;CHOI, HAN YOUNG |
分类号 |
G03F7/004;G02F1/13;G03F7/11 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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