发明名称 半導体装置
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device capable of suppressing deterioration of device characteristics resulting from doping with Fe.SOLUTION: A semiconductor device comprises: a semiconductor layer 26 made of a GaN doped with Fe; a first buffer layer 30 which is formed in contact with an upper surface of the semiconductor layer 26 and is made of an AlN or an AlGaN (0.4<x<1); and an operation layer which is formed on the first buffer layer 30 and is made of a GaN-based semiconductor 28.</p>
申请公布号 JP5778318(B2) 申请公布日期 2015.09.16
申请号 JP20140118936 申请日期 2014.06.09
申请人 发明人
分类号 H01L21/338;H01L21/336;H01L29/778;H01L29/78;H01L29/812 主分类号 H01L21/338
代理机构 代理人
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