发明名称 |
Inverter logic devices including graphene field effect transistor having tunable barrier |
摘要 |
Inverter logic devices include a gate oxide on a back substrate, a first graphene layer and a second graphene layer separated from each other on the gate oxide, a first electrode layer and a first semiconductor layer separated from each other on the first graphene layer, a second electrode layer and a second semiconductor layer separated from each other on the second graphene layer, and an output electrode on the first and second semiconductor layers and configured to output an output signal. The first semiconductor layer is doped with a different type of impurities selected from n-type impurities and p-type impurities than the second semiconductor layer. |
申请公布号 |
US9136336(B2) |
申请公布日期 |
2015.09.15 |
申请号 |
US201213593708 |
申请日期 |
2012.08.24 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Heo Jin-seong;Park Seong-jun;Chung Hyun-jong;Song Hyun-jae;Yang Hee-jun;Seo David |
分类号 |
H01L27/085;H01L29/16;H01L29/66;B82Y10/00;H01L29/786;H01L27/092;H01L21/8238 |
主分类号 |
H01L27/085 |
代理机构 |
Harness, Dickey & Pierce |
代理人 |
Harness, Dickey & Pierce |
主权项 |
1. An inverter logic device, comprising:
a gate oxide on a back gate substrate; a first graphene layer and a second graphene layer physically separated from each other by a gap on the gate oxide; a first electrode layer and a first semiconductor layer on a same surface of the first graphene layer and separated from each other; a second electrode layer and a second semiconductor layer on a same surface of the second graphene layer and separated from each other, wherein the first semiconductor layer is doped with a different type impurities selected from n-type impurities and p-type impurities than the second semiconductor layer; a third electrode on the first semiconductor layer overlapping the first graphene layer; a fourth electrode on the second semiconductor layer overlapping the second graphene layer; and an output electrode connected to the third electrode and the fourth electrode, wherein the first semiconductor layer faces the back gate substrate with the first graphene layer therebetween, and the second semiconductor layer faces the back gate substrate with the second graphene layer therebetween. |
地址 |
Gyeonggi-Do KR |