发明名称 Polishing apparatus for flattening surface of workpiece
摘要 To provide a polishing apparatus capable of more accurately determining a polishing end point. The polishing apparatus includes a turntable 12, a first electric motor 14 configured to rotationally drive the turntable, a top ring 20 configured to hold a workpiece together with the turntable, and a second electric motor 22 configured to rotationally drive the top ring. The polishing apparatus further includes a weighting unit configured to perform weighting so as to make the current ratios of the respective phases different from each other, and a torque variation detecting unit configured to detect a change in a phase current greatly weighted by the weighting unit and thereby detects a change in torque of the electric motor, the change being generated by performing the polishing.
申请公布号 US9132525(B2) 申请公布日期 2015.09.15
申请号 US201314040449 申请日期 2013.09.27
申请人 Ebara Corporation 发明人 Shinozaki Hiroyuki
分类号 B24B49/16;B24B37/013;B24B49/10 主分类号 B24B49/16
代理机构 Baker & Hostetler LLP 代理人 Baker & Hostetler LLP
主权项 1. A polishing apparatus for flattening a surface of a workpiece, the polishing apparatus comprising: a polishing table; a first electric motor configured to rotationally drive the polishing table; a substrate holding unit configured to hold the workpiece; a second electric motor configured to rotationally drive the substrate holding unit, at least one of the first and second electric motors having a plurality of phase windings; a weighting unit configured to make currents of the plurality of phase windings different from each other; and a torque variation detecting unit configured to detect a change in a current made by the weighting unit and thereby detect a change in torque of the at least one of the first and second electric motors, the change being generated by performing a polishing of the workpiece.
地址 Tokyo JP