PREPARATION METHOD FOR LIGHT BARRIER SUBSTRATE

摘要

A preparation method for a light barrier substrate, comprising the following steps: forming a metal electrode pattern on an underlayment (1) by a first pattern composition process; forming an insulation layer film above the underlayment (1) and the metal electrode pattern; forming a metal electrode via hole (6) on an insulation layer (3) by a second pattern composition process using a half-tone masking technology, and forming, on the insulation layer (3), a channel pattern (7) which is required to connect a metal electrode to an external IC; and forming a transparent electrode layer (5) on the underlayment (1), on which the metal electrode via hole (6) and the channel pattern (7) are formed. By means of the half-tone masking process, the masking steps for forming the insulation layer and the transparent electrode layer can be reduced, the process is simplified, the preparation efficiency is improved, the usage of a mask plate is reduced, and the preparation costs of a light barrier substrate are reduced.