发明名称 (METH)ACRYLATE COPOLYMER AND METHOD FOR PRODUCING SAME
摘要 Provided is a copolymer having excellent calcium ion trapping ability, calcium carbonate dispersing capacity, and gel resistance. A (meth)acrylic acid-based copolymer contains, as essential structural units, a structural unit (a) derived from a monomer represented by the following formula (1) in an amount of 2% by mole or more and 9% by mole or less, and a structural unit (b) derived from a (meth)acrylic acid (salt) in an amount of 91% by mole or more and 98% by mole or less, relative to 100% by mole of structural units derived from all monomers, wherein the copolymer contains a sulfonic acid (salt) group at least one end of the main chain and has a weight average molecular weight of 7000 to 100000,;;wherein R2 represents a hydrogen atom or a methyl group; and X and Y each independently represent a hydroxyl group or a sulfonic acid (salt) group (at least one of X and Y represents a sulfonic acid (salt) group).
申请公布号 US2015252129(A1) 申请公布日期 2015.09.10
申请号 US201314426293 申请日期 2013.10.02
申请人 NIPPON SHOKUBAI CO., LTD. 发明人 Nakano Masato;Sano Yuki
分类号 C08F220/06 主分类号 C08F220/06
代理机构 代理人
主权项 1. A (meth)acrylic acid-based copolymer comprising, as essential structural units: a structural unit (a) derived from a monomer represented by the following formula (1) in an amount of 2% by mole or more and 9% by mole or less relative to 100% by mole of structural units derived from all monomers; and a structural unit (b) derived from a (meth)acrylic acid (salt) in an amount of 91% by mole or more and 98% by mole or less relative to 100% by mole of structural units derived from all monomers, wherein the copolymer contains a sulfonic acid (salt) group at least one end of the main chain and has a weight average molecular weight of 7000 to 100000,wherein R2 represents a hydrogen atom or a methyl group; and X and Y each independently represent a hydroxyl group or a sulfonic acid (salt) group, with at least one of X and Y representing a sulfonic acid (salt) group.
地址 Osaka-shi, Osaka JP