LOWER SIDE WALL FOR EPITAXIAL GROWTH APPARATUS

摘要

Embodiments described herein relate to a lower side wall for use in a processing chamber. In one embodiment, the lower side wall includes an annular body. The annular body as an inner circumference, an outer circumference, a plurality of flanges projecting from the inner circumference, and a first concave portion formed in the outer circumference. The outer circumference has a plurality of grooves arranged in a circumferential direction of the lower side wall. In another embodiment, the annular body further includes a top surface having a mounting surface formed thereon and a second concave portion formed opposite the first concave portion. The second concave portion has a plurality of purge holes. In another embodiment, each groove of the plurality of grooves formed in the first concave portion has an arc shape.

主权项

1. A lower side wall for use in a processing chamber, the lower side wall comprising:
an annular body comprising:
an inner circumference;an outer circumference concentric with the inner circumference; anda first concave portion formed in the outer circumference, the first concave portion further comprising:a plurality of grooves formed in the first concave portion and isolated from the inner circumference of the body, the grooves arranged along a circumferential direction of the lower side wall.