发明名称 VTFT INCLUDING OVERLAPPING ELECTRODES
摘要 A vertical transistor includes a substrate and an electrically conductive gate structure having a top surface and including a reentrant profile. A conformal electrically insulating layer that maintains the reentrant profile is in contact with the electrically conductive gate structure and at least a portion of the substrate. A conformal semiconductor layer that maintains the reentrant profile is in contact with the conformal electrically insulating layer. An electrode that extends into the reentrant profile is in contact with a first portion of the semiconductor layer. Another electrode is vertically spaced apart from the electrode, overlaps a portion of the electrode that extends into the reentrant profile, is in contact with a second portion of the semiconductor material layer over the top surface of the electrically conductive gate structure, and is within the reentrant profile.
申请公布号 US2015255624(A1) 申请公布日期 2015.09.10
申请号 US201414198643 申请日期 2014.03.06
申请人 Nelson Shelby Forrester;Ellinger Carolyn Rae;Tutt Lee William 发明人 Nelson Shelby Forrester;Ellinger Carolyn Rae;Tutt Lee William
分类号 H01L29/786;H01L29/10;H01L29/423 主分类号 H01L29/786
代理机构 代理人
主权项 1. A vertical transistor comprising: a substrate; an electrically conductive gate structure including a reentrant profile, the electrically conductive gate structure having a top surface; a conformal electrically insulating layer that maintains the reentrant profile and is in contact with the electrically conductive gate structure and at least a portion of the substrate; a conformal semiconductor layer that maintains the reentrant profile and is in contact with the conformal electrically insulating layer; an electrode that extends into the reentrant profile and is in contact with a first portion of the semiconductor layer; and another electrode that is vertically spaced apart from the electrode, overlaps a portion of the electrode that extends into the reentrant profile, is in contact with a second portion of the semiconductor material layer over the top surface of the electrically conductive gate structure, and is within the reentrant profile.
地址 Pittsford NY US