发明名称 |
Device and method for coating a substrate |
摘要 |
<p>The apparatus has a process chamber (10) comprising a first source system (30) for the reactants and optionally carrier gases, and a pulsed operable second source system (70) for the reactants and optionally carrier gases. The first and second source systems are coupled such that plasma coating processes are feasible in process chamber. An independent claim is included for coating method of substrate.</p> |
申请公布号 |
EP2568061(A3) |
申请公布日期 |
2015.09.09 |
申请号 |
EP20120183118 |
申请日期 |
2012.09.05 |
申请人 |
SENTECH INSTRUMENTS GMBH |
发明人 |
RUDOLPH, ROLF;GARGOURI, HASSAN;ARENS, MICHAEL;WIEK, HELMUT;KRÜGER, ALBRECHT |
分类号 |
C23C16/455;C23C16/452;C23C16/507 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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