发明名称 CVDチャンバの流れ制御機構
摘要 <p>Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.</p>
申请公布号 JP5777615(B2) 申请公布日期 2015.09.09
申请号 JP20120520801 申请日期 2010.07.15
申请人 发明人
分类号 H01L21/31;C23C16/455 主分类号 H01L21/31
代理机构 代理人
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