发明名称 Light emitting diode
摘要 A light emitting diode (LED) including a first-type doped GaN substrate, a first-type doped semiconductor layer, an active layer, a second-type semiconductor layer, a first electrode, and a second electrode is provided. The first-type doped GaN substrate has a first doped element. The first-type semiconductor layer is disposed on the first-type doped GaN substrate. The first-type semiconductor layer has a second doped element different from the first doped element, and the doped concentration of the second doped element—may have a peak from 3E18/cm3 to 1E20/cm3 at an interface between the first-type doped GaN substrate and the first-type semiconductor layer. The active layer is disposed on the first-type semiconductor layer, and the second-type semiconductor layer is disposed on the active layer. The first electrode and the second electrode are respectively disposed on the first-type doped GaN substrate and the second-type semiconductor layer. Other LEDs are also provided.
申请公布号 US9130122(B2) 申请公布日期 2015.09.08
申请号 US201414181738 申请日期 2014.02.17
申请人 Industrial Technology Research Institute;WALSIN LIHWA Corp 发明人 Fu Yi-Keng;Tsai Chia-Lung;Chen Hung-Tse;Chou Chih-Hsuen
分类号 H01L29/06;H01L27/15;H01L21/00;H01L33/32;H01L33/02;H01L33/22 主分类号 H01L29/06
代理机构 Jianq Chyun IP Office 代理人 Jianq Chyun IP Office
主权项 1. A light emitting diode comprising: a first-type doped GaN substrate having a first doped element; a first-type semiconductor layer disposed on the first-type doped GaN substrate, the first-type semiconductor layer having a second doped element different from the first doped element, wherein a doped concentration of the second doped element has a peak from 3E18/cm3 to 1E20/cm3 at an interface between the first-type doped GaN substrate and the first-type semiconductor layer; an active layer located on the first-type semiconductor layer; and a second-type semiconductor layer located on the active layer, wherein the first type is an N type, the first doped element is an oxide doped element, and the second doped element is a silicon doped element.
地址 Hsinchu TW