Adaptive photomasks and methods for using the same

摘要

The embodiments described herein relate to methods, devices, and systems for masking a substrate using a photomasking process. An adaptive photomask configured to generate a photomasking pattern in accordance with dimensions of a surface feature on substrate is described. The adaptive photomask can be used to create customized photomask patterns for individual substrates. Methods and devices described herein can be used in manufacturing processes where similar parts having slight differences due to built-in tolerances are manufactured. Methods and a devices described herein can also be used in manufacture processes involving masking of three-dimensional portions of a part. A photomasking system that includes a translational mechanism for scanning a substrate surface is described.

主权项

1. A method for using a configurable aperture to dynamically activate a corresponding portion of a photoresist layer disposed on a surface of a substrate and associated with a feature on the surface of the substrate, the method comprising:
(a) receiving dimensional data associated with the feature, the dimensional data including data corresponding to a boundary of the feature, wherein the dimensional data is collected by scanning the surface of the substrate using an image capturing device; and (b) adjusting a size and shape of a transmissive portion of the configurable aperture in accordance with the received dimensional data, the transmissive portion allowing energy used to activate a corresponding portion of the photoresist layer to pass.