METHOD FOR FABRACATING SUBSTRATE WITH NANOSTRUCTURE

摘要

Disclosed are a method for manufacturing a substrate with a nano uneven structure formed thereon and a substrate manufactured thereby. The method of the present invention includes the following steps: forming a light scattering medium layer on a substrate; forming a metal organic ink layer made of a metal organic ink including a metal ingredient on the light scattering medium layer; forming a metal nano-mask by sintering the metal organic ink layer through heat treatment; forming a nano uneven structure by etching the light scattering medium layer; and manufacturing a substrate with the nano uneven structure by etching the metal nano-mask.