发明名称 Excimer laser and laser device
摘要 An excimer laser may include a frame, a base plate on which the frame is disposed, an excimer laser configured to oscillate and output laser light by discharge-pumping within a chamber containing a laser gas, an optical element that is mounted upon the frame and that is disposed in the optical path of the outputted laser light and a heat removal mechanism connected to both the frame and the base plate.
申请公布号 US9130338(B2) 申请公布日期 2015.09.08
申请号 US201313738028 申请日期 2013.01.10
申请人 GIGAPHOTON INC. 发明人 Kumazaki Takahito;Matsunaga Takashi;Takezawa Kazuya
分类号 H01S3/22;H01S3/04;G02B7/00;H01S3/08;H01S3/106;H01S3/225;H01S3/23 主分类号 H01S3/22
代理机构 Kratz, Quintos & Hanson, LLP 代理人 Kratz, Quintos & Hanson, LLP
主权项 1. An excimer laser comprising: a frame; a base plate on which said frame is disposed; an excimer laser configured to oscillate and output laser light by discharge-pumping within a chamber containing a laser gas; an optical element that is mounted upon said frame and that is disposed in the optical path of said outputted laser light; a heat removal mechanism connected to both said frame and said base plate; and a heat transfer mechanism having an interspace connected to both said frame and said base plate; wherein said heat transfer mechanism is an attitude adjustment mechanism mounted upon said base plate, said frame is mounted upon a mounting surface of said attitude adjustment mechanism, said attitude adjustment mechanism includes a lower plate section disposed upon said base plate, an upper plate section positioned above the lower plate section, a support section that supports the upper plate section relative to said lower plate section, a first adjustment section that supports said upper plate section relative to said lower plate section at a different location than the support section and that is configured to enable the distance between said lower plate section and said upper plate section to be adjusted, said interspace is defined as surrounded by the lower plate, the upper plate and the support section, said attitude adjustment mechanism is configured to adjust the tilt of said mounting surface relative to said base plate, and a first direction in which a bent area of said heat removal mechanism extends to be essentially parallel to a second direction in which said support section extends.
地址 Tochigi JP
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