| 发明名称 | Bisamineazaallylic ligands and their use in atomic layer deposition methods | ||
| 摘要 | Methods for deposition of elemental metal films on surfaces using metal coordination complexes comprising bisamineazaallylic ligands are provided. Also provided are bisamineazaallylic ligands useful in the methods of the invention and metal coordination complexes comprising these ligands. | ||
| 申请公布号 | US9127031(B2) | 申请公布日期 | 2015.09.08 |
| 申请号 | US201313908359 | 申请日期 | 2013.06.03 |
| 申请人 | Applied Materials, Inc. | 发明人 | Thompson David;Anthis Jeffrey W. |
| 分类号 | C07F19/00;C07F15/00;C23C16/18;C23C16/455;C07F11/00;C07F13/00;C07F1/10;C07F1/12;C07C211/13;C07F7/28;C07F9/00 | 主分类号 | C07F19/00 |
| 代理机构 | Servilla Whitney LLC | 代理人 | Servilla Whitney LLC |
| 主权项 | 1. A metal complex having a formula wherein M is a transition metal; each R is independently H, halide, linear or branched C1-6 alkyl, acyl, aldehyde, keto, C2-4 alkenyl, or is absent thereby forming an adjacent double bond; and L is an M-coordinating ligand selected from the group consisting of neutral ligands, anionic ligands and mixed ligands. | ||
| 地址 | Santa Clara CA US | ||