发明名称 |
PLASMA SOURCE AND PLASMA ETCHING DEVICE |
摘要 |
<p>A plasma generating apparatus according to the present invention includes a first electrode, a second electrode which faces the first electrode and forms a discharge space to generate an active piece, and a third electrode which is arranged in the discharge space and to which RF power is applied.</p> |
申请公布号 |
KR101550272(B1) |
申请公布日期 |
2015.09.07 |
申请号 |
KR20140058239 |
申请日期 |
2014.05.15 |
申请人 |
KODI-S CO., LTD. |
发明人 |
PARK, CHAN JUNG;NAM, CHANG KIL |
分类号 |
H05H1/34;H01L21/3065;H05H1/46 |
主分类号 |
H05H1/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|