发明名称 |
THIN FILM TRANSISTOR AND METHOD FOR FABRICATING THE SAME |
摘要 |
The embodiment of the present invention relates to a thin film transistor, a manufacturing method thereof, and a flat panel display device including the same. The thin film transistor includes: a gate electrode which is formed on a substrate; a gate insulation layer which is formed on the substrate including the gate electrode; an oxide semiconductor layer which is formed on the gate insulation layer including the gate electrode and includes a source region, a channel region, and a drain region; an oxide buffer layer which is formed on the oxide semiconductor layer and has a carrier density lower than the carrier density of the oxide semiconductor layer; a protection layer which is formed on the oxide buffer layer and the gate insulation layer, and has a contact hole to expose the oxide buffer layer of the source region and the drain region; and a source electrode and a drain electrode which are connected to the oxide buffer layer of the source region and the drain region through the contact hole. |
申请公布号 |
KR20150101487(A) |
申请公布日期 |
2015.09.04 |
申请号 |
KR20140022292 |
申请日期 |
2014.02.26 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
JEONG, WOONG HEE;KIM, SUN KWANG;KIM, HYEON SIK;AHN, BYUNG DU;CHOI, CHAUN GI |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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