发明名称 THIN FILM TRANSISTOR AND METHOD FOR FABRICATING THE SAME
摘要 The embodiment of the present invention relates to a thin film transistor, a manufacturing method thereof, and a flat panel display device including the same. The thin film transistor includes: a gate electrode which is formed on a substrate; a gate insulation layer which is formed on the substrate including the gate electrode; an oxide semiconductor layer which is formed on the gate insulation layer including the gate electrode and includes a source region, a channel region, and a drain region; an oxide buffer layer which is formed on the oxide semiconductor layer and has a carrier density lower than the carrier density of the oxide semiconductor layer; a protection layer which is formed on the oxide buffer layer and the gate insulation layer, and has a contact hole to expose the oxide buffer layer of the source region and the drain region; and a source electrode and a drain electrode which are connected to the oxide buffer layer of the source region and the drain region through the contact hole.
申请公布号 KR20150101487(A) 申请公布日期 2015.09.04
申请号 KR20140022292 申请日期 2014.02.26
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 JEONG, WOONG HEE;KIM, SUN KWANG;KIM, HYEON SIK;AHN, BYUNG DU;CHOI, CHAUN GI
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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