ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK HAVING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition from which a fine pattern with a small space width (for example, a line width of 50 nm or less) can be formed with high resolution while suppressing variations in a line width of a pattern depending on a PEB temperature, an actinic ray-sensitive or radiation-sensitive film using the composition, a mask blank including the film, a pattern forming method, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin (A) containing a repeating unit represented by general formula (4), and a crosslinking agent (C) containing a polar group. The crosslinking agent (C) is a compound represented by general formula (1), or a compound in which 2 to 5 structures represented by general formula (1) are connected by a connecting group represented by Lin general formula (3) or by a single bond.