主权项 |
1. A method of depositing cobalt, comprising volatilizing a cobalt precursor to form precursor vapor, and depositing cobalt from the precursor vapor in a vapor deposition process, wherein the cobalt precursor is selected from the group consisting of:
(a) cobalt hexacarbonyl complex precursors of the formula: wherein R1 and R2 may be the same as or different from one another, and each is independently selected from among H, C1-C4 alkyl, silyl-substituted alkyl, dialkylamide, ethylene, acetylene, alkynes, substituted alkenes, C1-C4 substituted alkynes, silylalkyl, silylamide, trimethylsilyl, trialkylsilyl-substituted alkynes, and trialkylsilylamido-substituted alkynes, and wherein R1 and R2 are not both H; (b) cobalt silylamide precursors; (c) cobalt (0) carbonyl complex precursors including at least one ligand selected from the group consisting of alkenes, allenes, alkynes, and Lewis base ligands; (d) cobalt hexacarbonyl dinitrile precursors of the formula [RN≡C—Co(CO)3]2, wherein R is independently selected from among H, C1-C4 alkyl, silyl-substituted alkyl, dialkylamide, ethylene, acetylene, alkynes, substituted alkenes, C1-C4 substituted alkynes, silylalkyl, silylamide, trimethylsilyl, trialkylsilyl-substituted alkynes, and trialkylsilylamido-substituted alkynes; and (e) cobalt dicarbonyl nitrile precursors of the formula (CO)2CoN≡O(C≡NR) wherein R is independently selected from among H, C1-C4 alkyl, silyl-substituted alkyl, dialkylamide, ethylene, acetylene, alkynes, substituted alkenes, C1-C4 substituted alkynes, silylalkyl, silylamide, trimethylsilyl, trialkylsilyl-substituted alkynes, and trialkylsilylamido-substituted alkynes. |