| 发明名称 |
METHOD OF MAKING THERMAL INSULATION FILM AND THERMAL INSULATION FILM PRODUCT |
| 摘要 |
A method that includes coating a photopolymer layer on a substrate to create a photopolymer coating, passing light from a light source through an aperture array to create a light interference pattern, and exposing the photopolymer coating to the light interference pattern to create cross-linked regions and non-cross-linked regions within the photopolymer coating. The method further includes creating a thermal insulation film product by dissolving the non-cross-linked regions to create a porous thermal insulation film disposed on the substrate. |
| 申请公布号 |
US2015248060(A1) |
申请公布日期 |
2015.09.03 |
| 申请号 |
US201514627505 |
申请日期 |
2015.02.20 |
| 申请人 |
Konica Minolta Laboratory U.S.A., Inc. |
发明人 |
Amano Jun |
| 分类号 |
G03F7/20;G03F7/30 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method, comprising:
coating a photopolymer layer on a substrate to create a photopolymer coating; passing light from a light source through an aperture array to create a light interference pattern; exposing the photopolymer coating to the light interference pattern to create cross-linked regions and non cross-linked regions within the photopolymer coating; and creating a thermal insulation film product by dissolving the non cross-linked regions to create a porous thermal insulation film disposed on the substrate. |
| 地址 |
San Mateo CA US |
