Pattern-forming method, and radiation-sensitive resin composition

摘要

A pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed. A developer solution used in developing the exposed resist film includes no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a first polymer and a radiation-sensitive acid generator. The first polymer includes a first structural unit having an acid-labile group and an alicyclic group. The alicyclic group is capable of avoiding dissociation from a molecular chain by an action of an acid.

主权项

1. A pattern-forming method comprising:
coating a radiation-sensitive resin composition on a substrate to provide a resist film; exposing the resist film; and developing the exposed resist film, wherein a developer solution used in developing the exposed resist film comprises no less than 80% by mass of an organic solvent, and the radiation-sensitive resin composition comprises:
a radiation-sensitive acid generator; anda first polymer that comprises a first structural unit, the first structural unit being represented by a formula (1) and having an acid-labile group and an alicyclic group, the acid-labile group being a group that substitutes for a hydrogen atom in a polar functional group, and that is dissociated by an action of an acid generated from the radiation-sensitive acid generator upon exposure, the alicyclic group being capable of avoiding dissociation from a molecular chain by an action of an acid,wherein, in the formula (1),
R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; R2 to R4 each independently represent an alkyl group having 1 to 20 carbon atoms, or a cycloalkyl group having 3 to 20 carbon atoms, or R2 represents an alkyl group having 1 to 20 carbon atoms, or a cycloalkyl group having 3 to 20 carbon atoms, and R3 and R4 taken together represent a ring together with the carbon atom to which R3 and R4 bond; CR2R3R4 is the acid-labile group; A represents the alicyclic group having 3 to 20 carbon atoms and having a valency of (n+1), the alicyclic group represented by A being not the acid-labile group; X represents a single bond, an alkanediyl group having 1 to 20 carbon atoms or an oxyalkanediyl group having 1 to 20 carbon atoms; and n is an integer of 1 to 3, wherein in a case where n is 2 or greater, a plurality of R2s are each identical or different, a plurality of R3s are each identical or different and a plurality of R4s are each identical or different.