图案形成方法、电子元件的制造方法及电子元件、以及感光化射线性或感放射线性树脂组成物及抗蚀剂膜;PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM

摘要

本发明的图案形成方法包括：使用下述(i)或(ii)的感光化射线性或感放射线性树脂组成物来形成膜的步骤；对所述膜进行曝光的步骤；及使用硷性显影液或含有有机溶剂的显影液将所述经曝光的膜的曝光部去除而形成图案的步骤。;(i)含有(A1)树脂的感光化射线性或感放射线性树脂组成物；(ii)含有(A2)树脂及(AD)具有一价碘原子的化合物的感光化射线性或感放射线性树脂组成物。; a step of exposing the film; and a step of removing an exposed part of the exposed film by an alkaline developer or a developer including an organic solvent to form patterns. ;(i) An actinic-ray- or radiation-sensitive resin composition including (A1) resin. ;(ii) An actinic-ray- or radiation-sensitive resin composition including (A2) resin and (AD) a compound having a monovalent iodine atom.