发明名称 |
Diode for variable-resistance material memories, processes of forming same, and methods of using same |
摘要 |
A variable-resistance material memory (VRMM) device includes a container conductor disposed over an epitaxial semiconductive prominence that is coupled to a VRMM. A VRMM device may also include a conductive plug in a recess that is coupled to a VRMM. A VRMM array may also include a conductive plug in a surrounding recess that is coupled to a VRMM. Apparatuses include the VRMM with one of the diode constructions. |
申请公布号 |
US9123891(B2) |
申请公布日期 |
2015.09.01 |
申请号 |
US201414530935 |
申请日期 |
2014.11.03 |
申请人 |
Micron Technology, Inc. |
发明人 |
Liu Jun;Violette Michael P. |
分类号 |
H01L45/00;G11C13/00;H01L27/24 |
主分类号 |
H01L45/00 |
代理机构 |
Schwegman Lundberg & Woessner, P.A. |
代理人 |
Schwegman Lundberg & Woessner, P.A. |
主权项 |
1. A process comprising:
forming an island in a semiconductive film to include an island first height; reducing the island first height to an island second height, wherein the island second height is defined by a first wall and a second wall in the semiconductive film; wherein forming the first and the second wall includes: forming a patterned nitride film above the semiconductive film, wherein the semiconductive film is an n-doped semiconductive material above a p-doped semiconductor material; etching the semiconductive film to expose the p-doped semiconductive material; wherein the etching exposes the first wall and second walls of the island second height to form a recess; filling adjacent the island with a shallow-trench isolation (STI); forming a metal diode plug above and within the island second height, wherein the metal diode plug also contacts the first wall and the second wall; forming an electrode above and on the metal diode plug; and coupling the electrode to a variable-resistance material memory (VRMM) cell. |
地址 |
Boise ID US |