发明名称 Diode for variable-resistance material memories, processes of forming same, and methods of using same
摘要 A variable-resistance material memory (VRMM) device includes a container conductor disposed over an epitaxial semiconductive prominence that is coupled to a VRMM. A VRMM device may also include a conductive plug in a recess that is coupled to a VRMM. A VRMM array may also include a conductive plug in a surrounding recess that is coupled to a VRMM. Apparatuses include the VRMM with one of the diode constructions.
申请公布号 US9123891(B2) 申请公布日期 2015.09.01
申请号 US201414530935 申请日期 2014.11.03
申请人 Micron Technology, Inc. 发明人 Liu Jun;Violette Michael P.
分类号 H01L45/00;G11C13/00;H01L27/24 主分类号 H01L45/00
代理机构 Schwegman Lundberg & Woessner, P.A. 代理人 Schwegman Lundberg & Woessner, P.A.
主权项 1. A process comprising: forming an island in a semiconductive film to include an island first height; reducing the island first height to an island second height, wherein the island second height is defined by a first wall and a second wall in the semiconductive film; wherein forming the first and the second wall includes: forming a patterned nitride film above the semiconductive film, wherein the semiconductive film is an n-doped semiconductive material above a p-doped semiconductor material; etching the semiconductive film to expose the p-doped semiconductive material; wherein the etching exposes the first wall and second walls of the island second height to form a recess; filling adjacent the island with a shallow-trench isolation (STI); forming a metal diode plug above and within the island second height, wherein the metal diode plug also contacts the first wall and the second wall; forming an electrode above and on the metal diode plug; and coupling the electrode to a variable-resistance material memory (VRMM) cell.
地址 Boise ID US