| 摘要 |
Provided, as an orientation control layer for an MgO film, is a BCC-structure Cr-based alloy having a lattice constant for which mismatch with a (001) surface of the MgO is minimal, and a fine and uniform crystal grain distribution. Also provided is a sputtering target material comprising the alloy. This alloy is a magnetic recording-use Cr alloy, the alloy including, in atomic percent, one or more types of elements selected from a group comprising Al, Ti, Mo, W, V, and Ru, in total, in amounts for which the value of a in formula (1) is greater than or equal to 2.919 Å and less than or equal to 3.037 Å, a3 = N/&rgr;&Sgr;(MnAn) (1) [in the formula, a represents the lattice constant, N represents Avogadro's number, &rgr; represents calculated density (g/cm3), m represents the number of elements existing within a unit cell, and A represents atomic weight]. The alloy also includes one or more types of elements selected from a group comprising B, C, P, Si and Sn so as to total 0.1 to 5%, and the remainder comprising Cr and unavoidable impurities. |
