| 发明名称 |
METHOD AND SYSTEM OF CHEMICAL BATH DEPOSITION |
| 摘要 |
An apparatus for chemical bath deposition includes a housing defining a chemical tank, a circulation pipe, and at least one flow adjustment device disposed inside the chemical tank. The chemical tank has an opening on a top surface and is configured to accept and hold at least one substrate inside the chemical tank. The circulation pipe has at least one portion inside the chemical tank, and is configured to supply at least one chemical to the chemical tank. The at least one flowing adjustment device includes any one of a turbine, a diffuser and a bubbler, or a combination thereof. |
| 申请公布号 |
US2015239001(A1) |
申请公布日期 |
2015.08.27 |
| 申请号 |
US201414186002 |
申请日期 |
2014.02.21 |
| 申请人 |
TSMC Solar Ltd. |
发明人 |
TSAI Pei-Chen |
| 分类号 |
B05C11/10;B05C3/00;H01L31/18;B05C3/02 |
主分类号 |
B05C11/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for chemical bath deposition, comprising:
a housing defining a chemical tank, the chemical tank having an opening on a top surface and configured to accept and hold at least one substrate therein; a circulation pipe, having at least one portion inside the chemical tank, and configured to supply at least one chemical to the chemical tank; and at least one flow adjustment device disposed inside the chemical tank, the at least one flowing adjustment device comprises a turbine or a diffuser. |
| 地址 |
Taichung City TW |
