发明名称 VERTICAL BIPOLAR JUNCTION TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 The present disclosure relates to a vertical bipolar junction transistor. A vertical bipolar junction transistor includes a high concentration doping region emitter terminal disposed on a semiconductor substrate; a high concentration doping region collector terminal disposed on a semiconductor substrate; a high concentration doping region base terminal disposed between the emitter terminal and the collector terminal; a drift region having a first doping concentration surrounding the emitter terminal and being deeper than either the base terminal or the collector terminal; a base layer disposed below the drift region; a collector layer in contact with the base layer, the collector layer having a second doping concentration higher than the first doping concentration. The manufacturing cost of the vertical bipolar junction transistor can be lowered and a current gain can be elevated using a low-cost BCD process.
申请公布号 US2015243770(A1) 申请公布日期 2015.08.27
申请号 US201414525545 申请日期 2014.10.28
申请人 MagnaChip Semiconductor, Ltd. 发明人 HEBERT Francois;PANG Yon Sup;CHO Seong Min;KIM Ju Ho
分类号 H01L29/732;H01L29/66;H01L29/73 主分类号 H01L29/732
代理机构 代理人
主权项 1. A vertical bipolar junction transistor comprising: a high concentration doping region emitter terminal disposed on a semiconductor substrate; a high concentration doping region collector terminal disposed on a semiconductor substrate; a high concentration doping region base terminal disposed between the emitter terminal and the collector terminal; a drift region having a first doping concentration surrounding the emitter terminal and being deeper than either the base terminal or the collector terminal; a base layer disposed below the drift region; and a collector layer in contact with the base layer, the collector layer having a second doping concentration higher than the first doping concentration.
地址 Cheongju-si KR