| 摘要 |
<p>The invention relates to a device for depositing a material by pulsed laser deposition, the device comprising: - a vacuum chamber; - at least one substrate holder with a substrate, arranged inside the vacuum chamber, the substrate having a first, second and third direction, each of the three directions perpendicular to each other, wherein the substrate is movable by the substrate holder in the first direction; - a target holder with a target, arranged inside the vacuum chamber and wherein the target extends over substantially the full length in the second direction of the substrate and parallel to the substrate; - at least one laser for irradiating the target, thereby creating a plasma of material that deposits on the substrate, wherein the position of incidence of the laser on the target is moveable parallel to the second direction of the substrate; and - a controller for controlling the movement of the substrate holder and the movement of the position of incidence of the laser on the target.</p> |
