发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, CURED OBJECT AND PRODUCTION METHOD THEREFOR, RESIN PATTERN PRODUCTION METHOD, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUTOFF FILTER, AND SOLID IMAGING DEVICE |
摘要 |
The purpose of the present invention is to provide a photosensitive resin composition from which can be obtained a cured object that has excellent opacity and high surface hardness even as a thin film, to provide a cured object, a cured object production method, a cured film, and a cured film production method wherein said photosensitive resin composition is cured, to provide a resin pattern production method, and to provide a liquid crystal display device, an organic EL display device, an infrared cutoff filter, and a solid imaging device that comprise said cured film. A photosensitive resin composition according to the present invention is characterized by containing: a polymer (component A) that has a structural unit having a group wherein an acid group is protected by an acid-labile group; a photoacid generator (component B); a solvent (component C); a compound (component D) that has a cross-linkable group and that has a molecular weight in the range of 100-2,000; and titanium black (component S). |
申请公布号 |
WO2015125871(A1) |
申请公布日期 |
2015.08.27 |
申请号 |
WO2015JP54632 |
申请日期 |
2015.02.19 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KASHIWAGI DAISUKE;ANDOU TAKESHI;YAMADA SATORU;KAWABE YASUMASA;TOMEBA HISAMITSU |
分类号 |
G03F7/039;G02B5/20;G02F1/1335;G03F7/004;G03F7/027;H01L51/50;H05B33/12 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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