| 发明名称 |
ELECTRON RADIATION MONITORING ELECTRODE SYSTEM TO PREVENT GOLD SPITTING AND RESIST CROSS-LINKING DURING EVAPORATION |
| 摘要 |
An electrode system configured to be positioned within a vacuum chamber of an electron-beam metal evaporation and deposition apparatus including a metal slug from which metal is evaporated during operation of the electron-beam metal evaporation and deposition apparatus. The electrode system includes a substantially ring-shaped electrode formed of a conductive material and a plurality of insulating standoffs configured to support the substantially ring-shaped electrode in the vacuum chamber in a position substantially surrounding the metal slug. |
| 申请公布号 |
US2015243567(A1) |
申请公布日期 |
2015.08.27 |
| 申请号 |
US201514700361 |
申请日期 |
2015.04.30 |
| 申请人 |
SKYWORKS SOLUTIONS, INC. |
发明人 |
Cheng Kezia |
| 分类号 |
H01L21/66;C23C14/30;C23C14/54;G01N27/00 |
主分类号 |
H01L21/66 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An electrode system configured to be positioned within a vacuum chamber of an electron-beam metal evaporation and deposition apparatus including a metal slug from which metal is evaporated during operation of the electron-beam metal evaporation and deposition apparatus, the electrode system comprising:
a substantially ring-shaped electrode formed of a conductive material; and a plurality of insulating standoffs configured to support the substantially ring-shaped electrode in the vacuum chamber in a position substantially surrounding the metal slug. |
| 地址 |
Woburn MA US |
