发明名称 APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES
摘要 An apparatus for processing wafer-shaped articles comprises a spin chuck adapted to hold and spin a wafer-shaped article of a predetermined diameter during a processing operation. A liquid collector surrounds the spin chuck, and comprises a first inner surface. The first inner surface comprises a first conductive material. The collector further comprises a first conductive pathway for grounding the first conductive material.
申请公布号 US2015243543(A1) 申请公布日期 2015.08.27
申请号 US201414188230 申请日期 2014.02.24
申请人 LAM RESEARCH AG 发明人 SCHWARZENBACHER Reinhold;PLISKA Milan
分类号 H01L21/687;H01L21/67 主分类号 H01L21/687
代理机构 代理人
主权项 1. Apparatus for processing wafer-shaped articles, comprising a spin chuck adapted to hold and spin a wafer-shaped article of a predetermined diameter during a processing operation to be performed on the wafer-shaped article, and a liquid collector surrounding said spin chuck, said liquid collector comprising a first inner surface, wherein said first inner surface comprises a first conductive material and wherein said collector further comprises a first conductive pathway for grounding said first conductive material.
地址 Villach AT