EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME

摘要

An exposure apparatus includes a substrate transfer unit which transfers a substrate in a first direction and includes a sensor which measures the intensity of UV, and an exposure unit which is arranged on the substrate transfer unit and exposes the substrate with UV. The exposure method using the exposure apparatus includes a measurement and calculation step (S100) of measuring the property of the UV generated in the exposure unit and calculating an exposure speed and a proper exposure amount of the exposure unit by using the property of the UV, a step (S200) of exposing the substrate by using the calculated exposure speed, a measurement and calculation step (S300) of measuring the property of the UV generated in the exposure unit again and calculating a new proper exposure amount and a new exposure speed of the exposure unit by using the property of the UV, and a step (S400) of exposing the substrate by using the calculated new exposure speed.