| 发明名称 | Method and device for manufacturing a barrier layer on a flexible substrate | ||
| 摘要 | The invention provides a method for manufacturing a barrier layer on a substrate, the method comprising: —providing a substrate with an inorganic oxide layer having a pore volume between 0.3 and 10 vol. %; —treating said substrate with an inorganic oxide layer in a glow discharge plasma, said plasma being generated by at least two electrodes in a treatment space formed between said two electrodes, said treatment space also being provided with a gas comprising Nitrogen compounds; and —the treating of the substrate in said treatment space is done at a temperature below 150° C., e.g. below 100° C. The invention further provides a device for manufacturing a barrier layer on a substrate. | ||
| 申请公布号 | US9117663(B2) | 申请公布日期 | 2015.08.25 |
| 申请号 | US201214126572 | 申请日期 | 2012.04.24 |
| 申请人 | Fujifilm Manufacturing Europe BV | 发明人 | Starostine Serguei;De Vries Hindrik |
| 分类号 | H01L21/3105;H01L21/02;C23C16/40;C23C16/56;H01J37/32;H01L29/40 | 主分类号 | H01L21/3105 |
| 代理机构 | Banner & Witcoff, Ltd. | 代理人 | Banner & Witcoff, Ltd. |
| 主权项 | 1. A method for manufacturing a barrier layer on a substrate, the method comprising: providing a substrate with an inorganic oxide layer having a pore volume between 0.3 and 10 vol. %; treating said substrate with an inorganic oxide layer in a glow discharge plasma, said plasma being generated by at least two electrodes in a treatment space formed between said two electrodes, said treatment space also being provided with a gas comprising Nitrogen compounds; and the treating of the substrate in said treatment space is done at a temperature below 150° C. | ||
| 地址 | NL | ||