发明名称 POLISHING CLOTH AND METHOD FOR MANUFACTURING POLISHING CLOTH
摘要 PROBLEM TO BE SOLVED: To provide a polishing cloth in which a foreign matter is hard to be left in a recess provided in a polishing surface, and a method for manufacturing the polishing cloth.SOLUTION: A polishing cloth according to the present embodiment has a recess in a polishing surface thereof which contacts a polishing object, and a water-repellent and oil-repellent material is coated on at least a bottom surface of the recess. A method for manufacturing the polishing cloth according to the present embodiment is relevant to a method for manufacturing a polishing cloth having a recess in a polishing surface contacting a polishing object. According to the method, a water-repellent and oil-repellent material is coated on the whole of the polishing surface having the recess, and thereafter, the coating on a region of the polishing surface other than the recess is removed, whereby a polishing cloth, in which the water-repellent and oil-repellent material is coated on at least the bottom surface of the recess, can be manufactured.
申请公布号 JP2015150635(A) 申请公布日期 2015.08.24
申请号 JP20140025523 申请日期 2014.02.13
申请人 TOSHIBA CORP 发明人 KAWAGUCHI TORU
分类号 B24B37/26;B24B37/24;H01L21/304 主分类号 B24B37/26
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